心地よい保湿マスク Napura Sun System Pleasure Mask

AQUA, PROPYLENE GLYCOL, GLYCERIN, ETHYLHEXYL COCOATE, CYCLOPENTASILOXANE, HELIANTHUS ANNUUS SEED OIL, COCOGLYCERIDES, CETEARYL ISONONANOATE, ALOE BARBADENSIS LEAF EXTRACT, COCO-CAPRYLATE, ACHILLEA MILLEFOLIUM FLOWER EXTRACT, HYDROXYETHYL ACRYLATE/SODIUM ACRYLOYLDIMETHYL TAURATE COPOLYMER, CALENDULA OFFICINALIS FLOWER EXTRACT, OENOTHERA BIENNIS OIL, CAMELLIA SINENSIS LEAF OIL, HYALURONIC ACID, CHAMOMILLA RECUTITA FLOWER EXTRACT, MANGIFERA INDICA SEED BUTTER, ECHINACEA ANGUSTIFOLIA ROOT EXTRACT, PHOSPHOLIPIDS, METHYL DIISOPROPYL PROPIONAMIDE, PROPANEDIOL, PARFUM, LAURYL GLUCOSIDE, HONEY, COCOS NUCIFERA OIL, MENTHOL, SPHINGOLIPIDS, DICAPRYLYL CARBONATE, SQUALANE, CETEARETH-20, SODIUM POLYACRYLATE, PHENETHYL ALCOHOL, GLYCERYL STEARATE, BENZYL SALICYLATE, CETEARYL ALCOHOL, BHT, POLYGLYCERYL-2 DIPOLYHYDROXYSTEARATE, SODIUM BENZOATE, UNDECYL ALCOHOL, POLYSORBATE 60, CETYL PALMITATE, LINALOOL, CETEARETH-12, SORBITAN ISOSTEARATE, HEXYL CINNAMAL, GERANIOL, LIMONENE, CITRONELLOL, COUMARIN, EUGENOL.